The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 1978

Filed:

Oct. 04, 1977
Applicant:
Inventors:

William C Hughes, Scotia, NY (US);

Harold G Parks, Scotia, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
313430 ; 313431 ; 335210 ;
Abstract

An improved fine deflection, for use in an electron beam optical system, utilizes a magnetic deflector positioned adjacent to the surface of the target most remote from a matrix lens, which is positioned between the target and an electron beam emitter. The matrix lens is a single plate having multiple apertures forming matrix lenslets and has an electron beam accelerator positioned between the lens and the target for uniform acceleration of the electron beam passing through a selected one of the lenslets.


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