The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 1978

Filed:

Aug. 23, 1977
Applicant:
Inventors:

Tamotsu Miki, Ichihara, JP;

Shizuo Narisawa, Ichihara, JP;

Ichiro Ichikawa, Ichihara, JP;

Hideki Horiike, Ichihara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
2608 / ;
Abstract

By block-copolymerizing a vinyl aromatic compound and a conjugated diene in a hydrocarbon solvent with an organolithium compound as initiator, there is obtained a block copolymer which comprises in the molecule three blocks of homopolymerized vinyl aromatic compound, randomly copolymerized vinyl aromatic compound and conjugated diene, and homopolymerized diene, respectively. The resulting block copolymer is transparent and excellent in mechanical properties, and is suitable for use in the manufacture of sheeting, film, and various molded articles.


Find Patent Forward Citations

Miki, Tamotsu. (1978). Method for producing transparent block copolymer resin (U.S. Patent No. 4122134). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4122134

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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