The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1978
Filed:
Apr. 15, 1977
Kaoru Furukawa, Takatsuki, JP;
Koichi Matsunami, Otsu, JP;
Toshihiko Ota, Otsu, JP;
Tetsushi Murakami, Otsu, JP;
Hiroshi Nagai, Otsu, JP;
Kazuo Tamaki, Otsu, JP;
Toyo Boseki Kabushiki Kaisha, Osaka, JP;
Abstract
A process for preparing a biaxially stretched film of a polyamide blend, which comprises (1) melt extruding a polyamide blend to make an unstretched film and (2) stretching the unstretched film first in the machine direction and then in the transverse direction, or (2') stretching the unstretched film first to make a uniaxially stretched film having a plane orientation index of about 0.6 to 1.7 and then stretching the uniaxially stretched film in a direction substantially at a right angle to the direction at the previous stretching, said polyamide blend comprising 97 to 80% by weight of an .alpha.-type aliphatic polyamide (Component A) and 3 to 20% by weight of at least one polyamide (Component B) selected from the group consisting of (i) an .alpha.-type aliphatic polyamide different from the Component A, (ii) a .gamma.-type aliphatic polyamide, (iii) a non-crystalline aliphatic polyamide, and (iv) a ring-containing polyamide which contains in the molecule 0 to 50 mol % of repeating units comprising a xylylenediamine residue.