The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1978
Filed:
May. 18, 1977
Bogdan Zega, Geneva, CH;
Battelle Memorial Institute, Carouge/Geneva, CH;
Abstract
A substrate to be coated by the ion-plating technique is placed on or in the immediate vicinity of a first cathode confronting a second cathode in an enclosure containing a rarefied gaseous atmosphere, the second cathode constituting a target of material to be deposited on the substrate. The application of a relatively high negative biasing voltage to the first cathode, relative to the grounded enclosure, generates a glow discharge resulting in ionic cleaning of the substrate. A sputtering discharge generated by a relatively low negative biasing voltage on the second cathode is intensified by a toroidal magnet on its far side (remote from the first cathode) whose lines of force penetrate the target and close in the intercathode space to form an endless track for circulating electrons. During the cleaning phase, the substrate is protected against premature particle deposition by the temporary interposition of a shield between itself and the target or by being located at a distance from the active portion of the second cathode; energization of the latter thereafter builds up a coating of target material on the cleaned substrate.