The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1978
Filed:
Dec. 13, 1974
Donald E Stargell, North Canton, OH (US);
Van Dorn Company, Cleveland, OH (US);
Abstract
A method of cold drawing, forming and otherwise cold working a sheet metal blank to form a can end member for seaming to one end of a can body in which the can end has a continuous score line along which the can end is severed for complete removal of an end panel, and in which a protective metal fold is formed in the can end with portions of the fold metal extending to a location circumferentially outward beneath and beyond the score line location to present a dull hazard-free edge on the end panel when torn from the can end member. The metal working procedure includes steps of blanking, drawing, panel forming, curling, redrawing, resizing, coining, scoring, out-folding and embossing, by cold working operations performed on a thin sheet metal blank to produce a can end, accompanied by forming an integral rivet to join a pull tab to the end panel portion of the can end. A can end with a continuous annular three layer fold having a continuous annular score line in the top layer. The two lower layers extend radially beneath and beyond the location of the score line. There is a 100.degree. sector of the three layer fold part extending on either side of a center line of a pull tab connected to the can end used to sever the score line which is thicker than the remaining extent of the continuous fold; and the top layer in the sector has a clearance space above the two lower layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile