The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1978
Filed:
May. 21, 1976
Heiner Herbst, Haar, DE;
Ruediger Mueller, Munich, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A lateral bipolar transistor has a silicon film which is epitaxially deposited on an electrical insulating substrate. The silicon film is doped with impurities of a first conductivity type such that a portion of the film may be utilized as a base zone. Within the base zone an emitter zone and a collector zone are formed of the second conductivity type. A highly doped zone of the second conductivity type is produced by deep implantation at a position which is contiguous and below the base zone, below the emitter and collector zones, and at a boundary between the silicon film and the electrical insulating substrate. An insulating zone over the film and a conductive layer over the base zone are also provided. The conductive film over the base zone together with the highly doped zone below and contiguous with the base minimize surface recombination and increase device gain.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile