The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 1978

Filed:

Mar. 29, 1977
Applicant:
Inventors:

Kenji Murase, Hyogo, JP;

Sei Sato, Hyogo, JP;

Hisashi Yamaguchi, Hyogo, JP;

Hirofumi Kashiwara, Hyogo, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B / ; H05B / ; H05B / ;
U.S. Cl.
CPC ...
3151 / ; 3403 / ;
Abstract

An improved driving system and method for shifting a discharge spot from a given discharge cell to an adjacent discharge cell in an A.C. gas discharge, or plasma display, panel, having opposed sets of electrodes respectively covered with corresponding dielectric layers thereby insulated from the discharge gas space. One set of electrodes comprises common electrodes extending in parallel relationship and defining the direction of propagation of the shifted discharge spots. The other set of electrodes, spaced apart from the first set by the gas space, extends in parallel relation transversely to the first common electrodes, and comprise the shift electrodes. The shift electrodes are arranged in groups of a predetermined number in each group and a corresponding number of buses permits selective application of shift pulses to the respectively associated shift electrodes in sequence for each group and simultaneously for the successive groups. An improved operating margin for the shift function is achieved by utilizing the priming discharge effect of a given cell currently discharging, to reduce the necessary firing voltage at an adjacent discharge cell to which the current discharge spot is to be shifted, while minimizing the probability of misfiring at corresponding, remote cells energized in the same phases. An overlap pulse is applied to a discharge cell at which a discharge spot currently is established, to provide a priming discharge for the adjacent cell to which the spot is to be shifted. A shift pulse applied to the adjacent cell terminates after termination of the overlap pulse and thereby produces a lateral field between the two adjacent discharge cells whereby the space charge generated by the priming discharge is attracted to and reduces the necessary firing voltage at the adjacent cell. The duration of the overlap pulse in relation to the amplitude of the shift pulse defines an operating margin for the shift operation which is optimized over a preferred range of the overlap pulse duration.


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