The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 1978

Filed:

Apr. 14, 1977
Applicant:
Inventors:

Kiyotsugu Ishikawa, Takatsuki, JP;

Kunio Itoh, Takatsuki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156628 ; 148187 ; 156655 ; 156662 ;
Abstract

A surface of a semiconductor substrate is coated with a mask having a desired doping pattern and the ions of a desired element are accelerated using the mask so that the structure of a predetermined region is changed. Thereafter the doped region or the region not doped is etched and removed.


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