The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1978
Filed:
Dec. 29, 1975
Applicant:
Inventor:
Alfred R Dozier, Huntington Beach, CA (US);
Assignee:
Tylan Corporation, Torrance, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118 49 ; 427 82 ; 427255 ;
Abstract
A cross-flow reactor for single pass reaction of a plurality of semiconductor wafers with process gas at spaced locations within a heated reactor chamber. The process gas flows along a heated length of the chamber, counterflows to at least three spaced locations within the chamber, traverses the longitudinal axis of the chamber at the spaced locations and then exhausts from the chamber. In a particular embodiment, two or more different process gases are delivered as separate streams to the spaced locations for convergent cross-flowing thereat.