The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 1978

Filed:

Jun. 15, 1976
Applicant:
Inventors:

Marcus Baumann, Basel, CH;

Vratislav Kvita, Muttenz, CH;

Martin Roth, Basel, CH;

John Sidney Waterhouse, Cherry Hinton, GB;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D / ;
U.S. Cl.
CPC ...
2603 / ; 2602 / ; 2603 / ; 2603 / ; 26032625 ; 26032626 ; 26032627 ; 26032641 ; 26032642 ; 26032643 ; 2603 / ; 2603 / ; 2603 / ; 2603 / ; 2603 / ; 2603 / ; 526242 ; 526259 ; 526263 ; 528 32 ; 528170 ; 528289 ; 528322 ; 528350 ; 528353 ;
Abstract

The imidyl compounds, according to the invention, of the formula I are suitable for the manufacture of polymers which can be crosslinked by light, which polymers can be, for example, polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amide-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitizers.


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