The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1978
Filed:
Jun. 30, 1977
Applicant:
Inventors:
Melvin Berkenblit, Yorktown Heights, NY (US);
See Ark Chan, Croton-on-Hudson, NY (US);
Arnold Reisman, Yorktown Heights, NY (US);
Stanley Zirinsky, Bronx, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; G01D / ;
U.S. Cl.
CPC ...
156628 ; 156644 ; 156647 ; 156661 ; 156667 ; 2041 / ; 252 792 ; 3461 / ; 4273 / ; 4273 / ; 427404 ;
Abstract
A method for etching at least one aperture having a defined crystallographic geometry in single crystals which includes masking the crystal to protect predetermined portions thereof from being etched, and then anisotropically etching with a mixture of sulfuric acid and phosphoric acid.