The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1978
Filed:
Mar. 25, 1976
Edwin D Hornbaker, Baton Rouge, LA (US);
Adam Nugent, Jr, Baton Rouge, LA (US);
Ethyl Corporation, Richmond, VA (US);
Abstract
A method for reducing the vinyl chloride monomer content of polyvinyl chloride resins. The polyvinyl chloride-water slurry is placed in a vessel, and heat is applied to the vessel for a sufficient time to raise it to a suitable temperature for removal of vinyl chloride monomer from the resin. The resin slurry is agitated and also subjected to a vacuum to reduce the temperature during the heat stripping step. In a preferred method, the polvinyl chloride-water slurry is agitated in a closed vessel, heat is applied to rapidly heat the slurry to a temperature of at least about 50.degree. C, and vacuum is applied to the vessel. The slurry is then rapidly cooled by suitable means. The slurry is then dewatered and dried. Dried polyvinyl chloride resins produced by this process have been found to have a vinyl chloride monomer content below a detectable limit of about 2.0 ppm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile