The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 1978

Filed:

Jun. 09, 1977
Applicant:
Inventors:

Leroy Ligong Chang, Mohegan Lake, NY (US);

Leo Esaki, Chappaqua, NY (US);

George Anthony Sai-Halasz, Mohegan Lake, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 16 ; 357-3 ; 357-4 ; 357 88 ; 357 30 ; 307238 ; 365114 ; 365215 ;
Abstract

A semiconductor memory (storage) device is provided using layered semiconductor structures which produce spatially separate electron and hole wells. The state of the device depends upon whether or not charge carriers (electrons and holes) are confined in these wells. Thus, the device has a first state exhibiting one conductance or capacitance when the wells do not have charge carriers in them, and a second state (different conductance or capacitance) when charge carriers are confined in the potential wells. The lifetime of the state in which carriers are confined in the wells depends upon the amount of time required for electron-hole recombination and is expected to be very long since the electrons and holes are spatially separated. A preferred embodiment utilizes a layered heterostructure formed in the space charge region of a p-n junction. Electrons and holes are generated in the potential wells using either electrical injection or incident light, while reading is accomplished by measuring conductance or capacitance. Erasure of the device state is achieved by a reverse electrical bias which removes the electrons and holes from confinement in the potential wells. Confinement of electrons and holes in three dimensions is also achieved.


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