The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1978
Filed:
Apr. 04, 1977
Applicant:
Inventor:
Rodney D Henry, Anaheim, CA (US);
Assignee:
Rockwell International Corporation, El Segundo, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ; G02B / ; H01S / ;
U.S. Cl.
CPC ...
428409 ; 156614 ; 156645 ; 156667 ; 350 9610 ; 427126 ; 427131 ; 427292 ; 427309 ; 4274 / ; 428446 ; 428539 ; 428913 ;
Abstract
A multilayer dielectric mirror wherein the mirror substrate is of garnet. Chemical-mechanical final polishing of the substrate provides a surface relatively free of inhomogeneous strain for the deposition thereon of relatively homogeneous individual layers for a multilayer dielectric mirror coating.