The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1978
Filed:
Feb. 08, 1977
Grigory Borisovich Goldin, Moscow, SU;
Valentin Petrovich Khlebnikov, Moscow, SU;
Jury Vasilievich Jushkov, Moscow, SU;
Vadim Nikolaevich Maslov, Moscow, SU;
Oleg Evgenievich Korobov, Moscow, SU;
Vladimir Petrovich Kuklev, Moscow, SU;
Vladimir Grigorievich Demyanets, Fryazino Moskovskoi oblasti, SU;
Ljudvig Alexandrovich Dolomanov, Ljubertsy Moskovskoi oblasti, SU;
Emilia Stanislavovna Kudeyarova, Podolsk Moskovskoi oblasti, SU;
Vladimir Viktorovich Nechaev, Moscow, SU;
Ellin Petrovich Bochkarev, Moscow, SU;
Nikolai Georgievich Voronin, Moscow, SU;
Jury Anatolievich Drozdov, Moscow, SU;
Other;
Abstract
A device in which a reaction vessel is filled with a gas, and in which first and second equal and coaxial disks are located. They have parallel operational surfaces carrying respectively, at least one substrate and at least two sources of different semiconductor substances forming the semiconductor periodic structure. A substrate heater and a source heater are placed near the first and second disks, respectively. First and second electric motors are arranged outside the reaction vessel in order to rotate, respectively, the first and second disks about the vessel vertical axis, as well as a drive to shift one of the disks along the axis.