The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1978
Filed:
Oct. 28, 1975
Applicant:
Inventors:
Jacob Meyer Hammer, Trenton, NJ (US);
Clyde Carl Neil, Levittown, PA (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C23C / ;
U.S. Cl.
CPC ...
427162 ; 4272 / ; 427282 ; 427286 ; 350 9630 ;
Abstract
A technique for generating long narrow microstructures based upon the shadowing effect of thick slits placed between a source and a substrate. The method is particularly well suited for forming optical waveguides using a mask having a slit with a width larger than the width of the stripe to be deposited and being thick relative to the width of said slit.