The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 1978

Filed:

Mar. 11, 1977
Applicant:
Inventors:

William N Coffey, Ballston Lake, NY (US);

George Jernakoff, Loudonville, NY (US);

John R Zurbrick, Cincinnati, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
73614 ; 73602 ;
Abstract

An energy reflection flaw detection system utilizes a programmable system synchronization means having high stability and resolution, to facilitate the detection of flaws within an object to be analyzed even in the presence of relatively large amplitude reflections from front and back surfaces of the object. A surface encounter attenuator is actuated by the system synchronizer to highly attenuate the front and back surface echoes and allow flaws closely adjacent to the surfaces to be resolved by the broadband apparatus. Novel means for adjusting the system gain to compensate for divergence of the interrogating energy beam with time and distance is also utilized in this novel apparatus.


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