The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 1978
Filed:
Oct. 29, 1976
Smallwood Holoman Jr, Midland, MI (US);
Robert G Asperger, Midland, MI (US);
Leroy S Krawczyk, Lake Jackson, TX (US);
The Dow Chemical Company, Midland, MI (US);
Abstract
An aqueous organic amine acid gas scrubbing system, particularly an aqueous N-methyldiethanolamine or diethanolamine acid gas scrubbing system having incorporated therein (1) a compound or mixture of compounds having the formula ##STR1## wherein n is an integer from 1 to 3, m is an integer from 2 to a number sufficient to yield a molecular weight of about 800, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each independently selected from the group consisting of --H, --C.sub.n' H.sub.2n' OH, --C.sub.n' H.sub.2n'+1, --C.sub.n' H.sub.2n' N(R.sub.3)R.sub.4 wherein n' is an integer from 1 to 2 and wherein R.sub.1 -R.sub.3 and R.sub.2 -R.sub.4 may be joined to form cyclic amines when n is 2; said compound being present in about 10 to about 2000 parts per million parts of treating solution; (2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and (3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm.