The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 1978

Filed:

Feb. 27, 1976
Applicant:
Inventors:

Tamotsu Miki, Ichihara, JA;

Shizuo Narisawa, Ichihara, JA;

Ichiro Ichikawa, Ichihara, JA;

Hideki Horiike, Ichihara, JA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
2608 / ;
Abstract

In block-copolymerizing a vinyl aromatic compound and a conjugated diene in a hydrocarbon solvent using an organolithium compound as initiator, a transparent block copolymer resin characterized by having elastomeric random copolymer blocks may be produced by continuously adding a mixture of the vinyl aromatic compound and the conjugated diene. The block copolymer resin thus obtained is transparent, excellent in mechanical characteristics and may be used in the fields of sheetings, films, and various molded articles.


Find Patent Forward Citations

Miki, Tamotsu. (1978). Process for producing transparent block copolymer resin (U.S. Patent No. 4089913). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4089913

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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