The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 1978
Filed:
Jan. 31, 1977
Franklin D Saeva, Webster, NY (US);
George R Olin, Webster, NY (US);
William W Limburg, Penfield, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Disclosed is an imaging method based upon the selective exposure of a select pair of photoactive materials to actinic radiation. According to this method, charge exchange between materials of a photosensitive mixture results in the selective decomposition of one of the components of said mixture. In the event that the above materials are dispersed within a polymeric film, the selective decomposition of one of these dispersed components will be manifest by changes induced in the polymeric film. Such changes in the characteristic properties of the film will, of course, vary depending upon the content of the dispersed photosensitive components in the film and the extent of decomposition of one of said materials.