The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 1978

Filed:

Jul. 05, 1977
Applicant:
Inventor:

Syed K Mowdood, Akron, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K / ;
U.S. Cl.
CPC ...
260 / ; 260 / ; 260 / ; 260 / ; 260 / ;
Abstract

An amide particularly suitable as a light stabilizer and also for copolymerizing with other monomers, wherein said amide has the following structure: ##STR1## where R.sub.1 is an aryl radical having the structure: ##STR2## WHERE A AND A' ARE SELECTED FROM HYDROGEN, HYDROXYL AND MEDIUM ALKYL HYDROCARBON RADICALS; B AND B' ARE SELECTED FROM HYDROGEN AND MEDIUM TO LOWER ALKYL HYDROCARBON RADICALS, AND C IS SELECTED FROM MEDIUM TO LOWER ALKYL HYDROCARBON RADICALS, ARYL KETONE RADICALS, 2'-HYDROXY ARYL KETONE RADICALS AND 4'-OCTYL ARYL KETONE RADICALS; R.sub.4 is selected from the aryl radicals of R.sub.1 and from aliphatic hydrocarbon radicals having from 1 to 8 carbon atoms; R.sub.2 is selected from hydrogen, methyl, ethyl, phenyl and --CH.sub.2 X radicals, where X is selected from chlorine, bromine or fluorine radicals; R.sub.3 is selected from medium and lower alkyl, cycloalkyl and aryl radicals; and where R.sub.5 is selected from hydrogen, methyl and chlorine radicals.


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