The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 1978
Filed:
Sep. 22, 1976
Fernand Bannie Kuffer, Brea, CA (US);
General Dynamics Corporation, Pomona, CA (US);
Abstract
A system for optically dividing an incident beam into segments and processing it through optics with obscurations, while maintaining the full power of the incident beam. The system utilizes a combination of mirror sets with the processing optics. The mirror sets incorporate spaced parallel reflecting surfaces nominally oriented at 45.degree. to the incident beam. The processing optics are of the type with optical member support structure, or obscuring secondary mirrors. The distance along the incident beam axis that the two surfaces of the mirror sets are separated determines the separation between the beam halves reflected from the first mirror set, and the beam quadrants reflected from the second mirror set. This is spaced to miss the structure or secondary obscuration.