The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1978
Filed:
May. 19, 1977
Applicant:
Inventor:
John Edmond Wolfe, Escondido, CA (US);
Assignee:
Burroughs Corporation, Detroit, MI (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250398 ; 2504 / ;
Abstract
A method of making a pattern for a photolithographic mask. A field ion source is advantageously utilized to produce heavy ions with a high beam current density. The ions are accelerated and directly bombard a metallic coating on the mask substrate to form openings therein in the desired pattern.