The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 1978

Filed:

Oct. 15, 1976
Applicant:
Inventors:

Wilfried Juergens, Munich, DT;

Manfred Roschy, Munich, DT;

Alois Schauer, Gruenwald, DT;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ; C23C / ;
U.S. Cl.
CPC ...
204 / ; 204 / ; 2041 / ; 2041 / ; 323 78 ; 333 / ; 338308 ; 361274 ;
Abstract

A thin-film circuit which includes temperature-compensated RC elements consisting of an AlTa alloy layer having approximately 3-17 at % tantalum in aluminum, which is sputtered or vapor deposited onto a non-conductive substrate, is produced by a process in which the AlTa alloy layer is deposited in an operative, reactive gas mixture, containing at least one of the gases O.sub.2, CO.sub.2, and N.sub.2 and the TC.sub.R value is established by the tantalum component of the alloy layer and/or partial pressure of the reactive gas, and the TC.sub.C value of the capacitors formed from the AlTa alloy layer is established by tempering to be at least approximately oppositely equal to the TC.sub.R value.


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