The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 1978

Filed:

Dec. 15, 1975
Applicant:
Inventors:

Hiroshi Sakai, Iwakuni, JA;

Yoshihiko Takeuchi, Iwakuni, JA;

Shizuka Kurisu, Iwakuni, JA;

Assignee:

Teijin Limited, Osaka, JA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
260860 ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 2608 / ;
Abstract

In a process for preparing soft polyesters which comprises reacting (A) terephthalic acid and/or its ester-forming derivative, (B) tetramethylene glycol and/or its ester-forming derivative and (C) a poly(oxyalkylene) glycol having a molecular weight of 500 to 5,000 and a ratio of the number of carbon atoms to that of oxygen atoms of 2 to 4.5, the improvement wherein after the reduced viscosity of the reaction product of the components (A), (B) and (C) has reached 0.1 (dl/g), the reaction product is further reacted with (D) a low-molecular-weight ester compound and/or a high-molecular-weight ester compound containing a terephthalic acid residue and an ethylene glycol residue or a low-molecular-weight ester compound and/or a high-molecular-weight ester compound containing a terephthalic acid residue and a 1,4-cyclohexane dimethanol residue to form a polyester-polyether block copolymer.


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