The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1978
Filed:
Oct. 29, 1976
Applicant:
Inventors:
Diana Jean Bendz, Vestal, NY (US);
Gerald Andrei Bendz, Vestal, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44D / ; B08B / ; C23D / ;
U.S. Cl.
CPC ...
427341 ; 96 351 ; 134 38 ; 156626 ; 156668 ; 252 795 ; 252364 ; 427259 ; 427272 ; 427273 ;
Abstract
Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
Bendz, Diana. (1978). Process for stripping resist layers from substrates (U.S. Patent No. 4078102). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4078102
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile