The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1978
Filed:
Aug. 16, 1976
Applicant:
Inventors:
Masao Yamawaki, Handa, JA;
Katsuo Aoki, Aichi, JA;
Osamu Ina, Okazaki, JA;
Takao Suzuki, Kariya, JA;
Yoshio Oka, Toyota, JA;
Kunihiko Hara, Kariya, JA;
Assignee:
Nippondenso Co., Ltd., Kariya, JA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118-6 ; 118 491 ; 118500 ; 214 / ; 4272 / ; 432253 ;
Abstract
The invention discloses an apparatus for thermal diffusion of semiconductor devices, wherein a plurality of wafer boats each made of a refractory material and adapted to carry a predetermined number of wafers to be processed are sequentially fed into a furnace tube containing a high temperature, diffusion gas atmosphere and continuously transported at a predetermined speed through the furnace tube so that each wafer may have substantially the same thermal treatment and high productivity may be attained.