The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 1978
Filed:
Oct. 07, 1976
Paul Rene Simon, Nice, FR;
Societe Francaise de l'Electro-Resistance, Nice, FR;
Abstract
A process for producing high precision electrical resistance elements and electrical resistance elements produced thereby are disclosed. The process includes the step of etching a masked metallic layer bonded to an electrically insulating substrate for a time sufficient to etch away substantially all the masking material and a predetermined portion of the metallic material to produce a high precision electrical resistance element having a predetermined ohmic value. Preferably, the masking material has an erosion rate under ion bombardment greater than the erosion rate of the metallic layer and the thickness of the masking material is established as a predetermined function of the metallic layer to be etched away.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile