The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1978
Filed:
Jun. 07, 1976
Applicant:
Inventors:
Kyo Suda, Hachioji, JA;
Katsumi Takami, Tokyo, JA;
Akira Shintani, Hachioji, JA;
Shinobu Hase, Hachioji, JA;
Assignee:
Hitachi, Ltd., , JA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C01B / ;
U.S. Cl.
CPC ...
427-8 ; 427 10 ;
Abstract
In forming a film of a purposive substance on a substrate by a chemical vapor deposition (CVD), the size of the film-forming substance particles formed in a reactor is detected as an electrical signal and flow rates of respective gases introduced into the reactor are controlled in response to this electrical signal. According to this control method, the fogging phenomenon owing to formation of the film-forming substance in the gas flow can be effectively prevented.