The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 1978

Filed:

Sep. 24, 1976
Applicant:
Inventors:

Hans-Dieter Pletka, Hanau, DT;

Rudolf Michel, Freigericht, DT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
2604 / ; 2604 / ;
Abstract

There is provided a process for the production of sulfur containing organosilicon compounds of the formula (I) Z--Alk--S.sub.x --Alk--Z, where Z is the grouping: ##STR1## in which R.sup.1 is an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group with 5 to 8 carbon atoms, the benzyl group, phenyl or phenyl substituted with at least one methyl, ethyl or chloro group and R.sup.2 is alkoxy of 1 to 8 carbon atoms, methoxyethoxy, cycloalkoxy with 5 to 8 carbon atoms, phenoxy or benzyloxy, Alk is divalent saturated hydrocarbon group having 1 to 10 carbon atoms or such a group interrupted once or twice by --O--, --S-- or --NH-- and x is a number from 2.0 to 6.0 comprising reacting a compound of the formula (II) Y--Alk--Hal, where Y is: ##STR2## WHERE Hal is fluorine, chlorine, bromine or iodine with at least one compound of the formula R.sup.3 OH in which R.sup.3 is alkyl of 1 to 8 carbon atoms, methoxyethyl, cycloalkyl with 5 to 8 carbon atoms, phenyl or benzyl or in the case of forming (d) reacting a tris alkoxysilane with triethanolamine to form the corresponding silatrane and with a hydrosulfide of the formula (III) MeSH, in which Me is ammonium, an alkali metal atom or an equivalent of an alkaline earth metal and with sulfur, preferably in the presence of at least one organic solvent, separating from the halide formed, and removing the organic solvent.


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