The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 1978
Filed:
Jul. 28, 1976
Applicant:
Inventors:
Whitney H Mears, Buffalo, NY (US);
Sabatino R Orfeo, Orchard Park, NY (US);
Assignee:
Allied Chemical Corporation, Morris Township, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01B / ;
U.S. Cl.
CPC ...
252 635 ; 174 / ; 174D / ; 2001 / ; 252 65 ; 252 66 ;
Abstract
Carbon formation on voltage breakdown and sparking, and consequent carbon deposits on insulators and other surfaces, is suppressed in dielectric gases of halogenated alkanes by adding SF.sub.6 and/or CO.sub.2 to the halogenated alkane to form a gaseous dielectric mixture. Moreover, certain of the gaseous dielectric mixtures evidence unexpectedly high dielectric breakdown voltages. The gaseous dielectric mixtures are useful in high voltage coaxial lines, in transformers, in minisubstations, and the like.