The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 1978
Filed:
Mar. 01, 1976
Sergei Michael Fomenko, Woodland Hills, CA (US);
Greenwood Mills, Inc., Greenwood, SC (US);
Abstract
First and second pairs of mirrors are oriented to intercept first and second regions respectively of a diffraction pattern and deflect these regions to individual detectors so that simultaneous analysis of the regions of the diffraction pattern can be carried out. The pairs of mirrors can be spaced along the optical axis in a manner to provide focused regions of the diffraction pattern at the detectors wherein the diffraction pattern itself is imaged at two spaced focal planes resulting from astigmatic conditions. The physical arrangement not only overcomes problems introduced by astigmatism but also permits practical physical positioning of individual photo-diode arrays such that simultaneous processing of the regions in the diffraction pattern can be carried out.