The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1978
Filed:
May. 08, 1975
Paul E Stuckert, Katonah, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Exposure images may be synthesized on a radiation responsive surface by causing effective relative motion between a mask and the surface. The mask contains at least two distinct exposure areas, each having a plurality of apertures arranged in different patterns from which at least two different images can be simultaneously synthesized. Radiation is directed through the plurality of apertures in a mask during a given period to expose a plurality of similarly shaped areas on a surface. During a second period electrons are similarly directed through the same mask which has been effectively displaced and a second plurality of contiguous areas are exposed. During third and fourth succeeding periods, third and fourth pluralities of contiguous areas are exposed. Thus, the image in each exposure area is synthesized from a plurality of contiguous four step exposure images which makes it possible to eliminate the 'stencil problem' and permit exposure of areas whose length is very much greater than their width.