The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1977
Filed:
Feb. 17, 1977
Applicant:
Inventors:
Nathaniel Grier, Englewood, NJ (US);
Richard A Dybas, Center Square, PA (US);
Robert A Strelitz, Edison, NJ (US);
Assignee:
Merck & Co., Inc., Rahway, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
2605 / ;
Abstract
Novel dibicyclo [3.1.1] and [2.2.1] heptyl and dibicyclo [3.1.1] and [2.2.1] heptenyl polyamines are useful antimicrobial agents, as well as algae inhibitors. They are especially useful as hard surface disinfectants and as additives to oil well drilling muds, injection brines and industrial water where bacterial control is desired.
Quick Actions:
Grier, Nathaniel. (1977). Novel dibicyclo [3.1.1] and [2.2.1] heptyl and dibicyclo [3.1.1] and (U.S. Patent No. 4065497). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4065497
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile