The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 1977

Filed:

Jun. 28, 1976
Applicant:
Inventors:

Duc Tien Tran, Paris, FR;

Jacques Kervizic, Paris, FR;

Bernard Hurt, Paris, FR;

Assignee:

C.G.R.-MeV, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
313 62 ;
Abstract

A high-frequency focusing device making it possible to achieve suitable horizontal and vertical focusing of a beam of charged particles issued from a particle source located substantially at the center of a cyclotron, this device comprising pairs of focusing electrodes fixed to the edges of parallel plates forming each sector-shaped Dees of the cyclotron, each pair of electrodes being arranged in such a manner that the particle beam passes between them, these electrodes which project into the acceleration space e of the cyclotron, making it possible to compensate for lack or excessive vertical focusing brought about by the magnetic field developed in the acceleration space e.


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