The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1977
Filed:
Aug. 23, 1976
George Edward Alcorn, Silver Spring, MD (US);
James Downer Feeley, Marshall, VA (US);
Julian Turner Lyman, Manassas, VA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process is disclosed for forming a ledge-free aluminum-copper silicon conductor structure that is free of the silicon bridging problem which has produced electrical shorting conditions in the prior art. The process comprises the steps of depositing the aluminum-copper metallurgy, depositing a photoresist layer to delineate the shape of the resulting conductors, etching the aluminum copper metallurgy with phosphoric/nitric acid, for example, removing the photoresist, evaporating a layer of silicon on the surface of the etched conductor layer, sintering the composite to drive the necessary amount of silicon into the aluminum-copper, and removing the residual silicon layer by a reactive plasma etching technique. The resulting conductor structure is free of silicon bridging.