The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 1977

Filed:

Feb. 28, 1977
Applicant:
Inventors:

Abraham Goldman, Kendall Park, NJ (US);

Pabitra Datta, Cranbury, NJ (US);

Assignee:

RCA Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156644 ; 96 361 ; 961149 ; 156661 ; 156904 ;
Abstract

The method comprises applying to a surface to be etched a coating of a liquid composition comprising an acid-precipitated casein, alkali dichromate photosensitizer, sodium borate and water. The layer is dried, photoexposed, developed and baked to produce an etch-resistant stencil.


Find Patent Forward Citations

Goldman, Abraham. (1977). Method for making etch-resistant stencil with dichromate-sensitized (U.S. Patent No. 4061529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4061529

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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