The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1977
Filed:
Sep. 17, 1976
Applicant:
Inventors:
Harry Louis Pinch, Princeton, NJ (US);
Herbert Irwin Moss, Yardley, PA (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 2041 / ; 2963 / ;
Abstract
A method for depositing a layer in which the concentration of constituent materials varies through its thickness employs a radio frequency sputtering apparatus. The deposition apparatus has a target composed of different component materials for the layer. The substrate is placed within the deposition apparatus and moved to various positions with respect to the target during the deposition.