The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1977
Filed:
Feb. 26, 1975
Daniel L Jassby, Princeton, NJ (US);
William M Hooke, Princeton, NJ (US);
Abstract
Electromagnetic (E.M.) energy injection method and apparatus for producing and sustaining suprathermal ordered ions in a neutral, two-ion-species, toroidal, bulk equilibrium plasma. More particularly, the ions are produced and sustained in an ordered suprathermal state of existence above the average energy and velocity of the bulk equilibrium plasma by resonant rf energy injection in resonance with the natural frequency of one of the ion species. In one embodiment, the electromagnetic energy is injected to clamp the energy and velocity of one of the ion species so that the ion energy is increased, sustained, prolonged and continued in a suprathermal ordered state of existence containing appreciable stored energy that counteracts the slowing down effects of the bulk equilibrium plasma drag. Thus, selective deuteron absorption may be used for ion-tail creation by radio-frequency excitation alone. Also, the rf can be used to increase the fusion output of a two-component neutral injected plasma by selective heating of the injected deuterons.