The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1977
Filed:
Mar. 26, 1976
Shigeo Moriyama, Kokubunji, JA;
Tatsuo Harada, Fuchu, JA;
Yoshio Kawamura, Kokubunji, JA;
Seiya Hashimoto, Tokyo, JA;
Akihiro Takanashi, Gainesville, FL (US);
Toshiei Kurosaki, Kokubunji, JA;
Shinji Kuniyoshi, Kokubunji, JA;
Sumio Hosaka, Kokubunji, JA;
Hitachi, Ltd., , JA;
Abstract
An improved optical exposure apparatus for use in exposing a workpiece to a desired light pattern with a high alignment accuracy and a high operational speed is disclosed. The apparatus comprises a moving table on which a workpiece to be exposed is disposed, a movable holder on which a mask having an original pattern is disposed, a light source for irradiating said mask, a reduction lens for projecting a reduced pattern of said original pattern onto said workpiece, means for positioning said moving table to a predetermined position, means for detecting the error of said table positioning, means for calculating a value of the error of positioning the workpiece divided by the reduction rate of the reduction lens, and means for automatically shifting said movable holder by the calculated value so as to cancel said error.