The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 1977
Filed:
Sep. 22, 1975
Sam R Turner, Webster, NY (US);
John M Pochan, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Disclosed is a method for enhancing the resistance to crystallization of solid solutions containing electron acceptor molecules. According to this method, electron acceptor molecules are chemically modified whereby the resulting compound is capable of undergoing polymerization. This modified material is thereafter dissolved in a suitable polymeric resin and subsequently exposed to a source of activating energy thereupon causing such modified material to polymerize within the polymeric resin. The resulting composition exhibits enhanced resistance to crystallization and thus is suitable for use in electrophotographic devices and methods.