The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1977
Filed:
Jun. 23, 1976
John Schlafer, Wayland, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
In an optical scanning apparatus for photolithographic processing of faceplates intended for color cathode ray tubes, a light beam from a source is first deflected through an angle related to a predetermined angle of incidence that an electron beam in an operating tube has with respect to a defined faceplate location, and then the deflection point is imaged onto or in the vicinity of the faceplate. This angle of incidence adjustment is accomplished for each faceplate location as the light beam is scanned over the surface of the faceplate. The light source, which is preferably a laser light source, creates a light beam having a wavelength spectrum which exposes the photosensitive material. The beam is deflected by a pair of orthogonally aligned mirrors which are rotated by galvanometers. Each galvanometer is driven by a current from an electrical control, the current being related to the proper angle of incidence for each faceplate location. An optical focusing device images the point of deflection of the light beam substantially onto the faceplate. This image of the deflection source is then scanned over the surface of the faceplate in a predetermined pattern by a mirror which is rotated about a pair of orthogonal axes by motors which are controlled by the electrical control. By this arrangement, the photoresist on the faceplate is correctly exposed at the proper location to be in registration with the electrons landing on the faceplate after passing through the same mask apertures in the completed cathode ray tube.