The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1977
Filed:
Aug. 27, 1975
Malcolm H Nickerson, Chagrin Falls, OH (US);
William R Rinker, Cuyahoga Falls, OH (US);
The B. F. Goodrich Company, Akron, OH (US);
Abstract
Apparatus and method for venting moisture from the interior of an enclosed space to atmosphere while restricting the flow of ambient moisture back into the enclosed space. A chamber is provided in fluid communication with the substantially enclosed space. Means are provided for absorbing solar energy for heating the interior of the chamber when the chamber is exposed to sunlight. A first pressure sensitive valve is effective to vent moisture, liquid or other fluids from the chamber to atmosphere and to block flow between the chamber and the substantially enclosed space during the periods when the chamber is exposed to sunlight. A second pressure sensitive valve blocks flow of ambient air into the chamber and vents moisture or other gaseous material from the substantially enclosed space to the chamber during periods when the chamber is not exposed to sunlight. The method, according to the present invention, comprises the steps of venting moisture from an enclosed space into a chamber during periods where the chamber is not exposed to sunlight, sealing against backflow of gaseous material from the chamber to the enclosed space and venting the chamber to the atmosphere during periods of heating of the chamber by the sunlight to thereby vent fluid material from the enclosed space to the atmosphere.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile