The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 1977
Filed:
Sep. 29, 1975
Noboru Horie, Kodaira, JA;
Hitachi, Ltd., , JA;
Abstract
A method of manufacturing a semiconductor integrated circuit device, which includes at least one junction field-effect transistor and at least one bipolar transistor, is characterized in that a groove portion is formed by chemically etching a part of a diffused layer for the channel region of the junction field-effect transistor, and that a layer for the gate of the junction field-effect transistor having a conductivity type to opposite to that of the channel region is formed by diffusion in the diffused layer of the channel region beneath the groove portion, whereby the pinch-off voltage V.sub.p of the junction field-effect transistor is made as small as possible and is also made smaller than the base-emitter reverse withstand voltage V.sub.BEO of the bipolar transistor.