The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 1977

Filed:

Dec. 16, 1975
Applicant:
Inventor:

Isao Arita, Tokyo, JA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
354 51 ; 354 37 ; 354 38 ; 354 41 ; 354 43 ; 354 / ; 354 / ;
Abstract

A diaphragm aperture value which has been set is transformed into corresponding frequency information. A local oscillator starts sweeping upon pushing of the shutter button. The output of the local oscillator and the frequency information are inputted to a mixer, and the output of the mixer is fed to a filter circuit, whose center frequency is variable according to the luminance information of an object to be photographed. Only a specific output frequency of the mixer passes through the filter circuit, and the output of the filter circuit generates a control signal which closes the shutter at a suitable diaphragm aperture time.


Find Patent Forward Citations

Arita, Isao. (1977). Exposure computation system (U.S. Patent No. 4048643). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4048643

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…