The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1977
Filed:
Jan. 31, 1975
Applicant:
Inventors:
Mikio Hirano, Hitachi, JA;
Masaki Takeshima, Hitachi, JA;
Toru Saito, Hitachi, JA;
Atou Shimozato, Hitachi, JA;
Assignee:
Hitachi, Ltd., , JA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
423240 ; 423241 ; 423245 ; 55 71 ; 55 74 ;
Abstract
A vent gas containing radioactive iodine and methyliodide is effectively decontaminated by chemically adsorbing the iodine contained in the vent gas onto an activated carbon layer at first, then physically adsorbing the methyl iodide contained in the vent gas onto another activated carbon layer separately disposed from the former activated carbon layer, and retaining the radioactive iodine and radioactive methyl iodide on the respective activated carbon layers for a definite period of radioactive decay.