The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1977
Filed:
Oct. 15, 1975
Paul Cyril Moutou, Paris, FR;
Thomson-CSF, Paris, FR;
Abstract
The method relates to the production of a very thin insulating or weakly-doped layer in the immediate neighborhood of a highly-doped layer within the body of a semiconductor structure designed to operate in the microwave range. For instance a P.sup.+ I N.sup.+ structure is obtained in an N.sup.+ -doped gallium arsenide substrate, by implanting a P.sup.+ - layer using beryllium ions. An insulating layer is spontaneously formed between the highly-doped layers. Using beryllium, the thickness is effectively of the order of one-tenth of a micron. In another example, an avalanche diode of high efficiency, made of gallium arsenide for microwave operation, having a P.sup.+ N.sup.- N.sup.+ N N.sup.+ structure is obtained wherein the layer N.sup.- is the thin weakly-doped layer in the immediate neighborhood of a highly-doped layer (N.sup.+), which is substantially as thin as the N.sup.- layer in this particular case.