The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 1977
Filed:
Jul. 11, 1975
Robert A Sylvester, Hilton, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
In a photographic film unit having a pair of sheets connected in superposition with a photosensitive layer located between the sheets, a container carrying a quantity of processing composition is arranged to provide for the discharge of the composition to between the sheets at the leading end of the film unit. A fluid receiver or trap is provided at the trailing end of the film unit to receive and store excess processing composition after it has been spread between the sheets. The trap includes trap spacing means, trap cover means, and trap-venting means formed of a plurality of holes through the trap cover means. The improvement comprises a processing-composition-impervious layer on the surface of and substantially coextensive with the trap spacing means adjacent the trap cover means whereby the processing composition is restrained from reaching the trap-venting holes without restraining air or gas from reaching the venting holes for escape from the film unit. The impervious layer may be sealed to the trap cover means transversely of the film unit along the trailing edge of the trap spacing means to improve the restraint of the processing composition.