The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1977
Filed:
Nov. 15, 1976
James A Harrington, Huntsville, AL (US);
Don A Gregory, Huntsville, AL (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
Disclosed are a method and the chemical solutions (a blend of H.sub.2 SO..4 and CH.sub.3 COOH) employed for producing high quality crystal surfaces on CaF.sub.2 and BaF.sub.2 by a chemical polishing cycle that follows a multistage mechanical polishing cycle. The high quality crystal surfaces on CaF.sub.2 and BaF.sub.2, which otherwise are of the quality for field of use, makes these crystals ideally suited for applications as windows for HF/DF laser since the chemically polished crystal surface has fewer irregularities which reduce the amount of surface scattering of the HF/DF radiation, thus allowing a more predictable output. The high quality surfaces achieved from chemical polishing are of particular value in the study of optical absorption of very low loss materials, where the scattered radiation produces heat.