The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1977
Filed:
Jan. 13, 1975
Applicant:
Inventors:
Raymond DiBugnara, Huntington Beach, CA (US);
Richard Allison, Los Angeles, CA (US);
Assignee:
TRW Inc., Los Angeles, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 93 ; 427193 ; 427240 ; 427299 ; 427344 ; 4273 / ; 4274 / ;
Abstract
A method for settling suspended glass particles from a slurry containing small amounts of a substance, which substance is preferentially adsorbed to the surface of the suspended glass particles, and which adsorbed substance facilitates centrifugal sedimentation of the glass particles without substantially altering the colloidal nature of the suspension. In particular, a method for forming a glass film on a semiconductive wafer or circuit, especially mesa etched structures, including the step of adding a small amount of hydrogen peroxide to the glass slurry before sedimentation of the glass film.